0191 5166636 enquiries@ht-uk.com

APPLICATIONS:

  • Semiconductor Wafer Cleaning (Wet Bench) Processes
  • Heating of Photo-Resist Removal Solvents
  • DI water Heating for Wafer Rinsing
  • Air and Nitrogen Heating for Wafer Drying
  • Heating of Acids, IPA, Piranha, NMP, etc.
  • For Use with Single Pass or Recirculating Systems

FEATURES & BENEFITS:

  • Fluid Path has No Contact with Heating Elements
  • Media is Isolated in PFA (Teflon®) Flow-Tube (High Purity Heating)
  • Allows for Safe Heating of Dangerous Liquids & Gases
  • Flow-Tube is Safe for Use with Many Caustic Solvents
  • Flow-Tube Is Field Replaceable (No Service Call Required)
  • Compatible with Standard Controls (PID, PLC, Multi-Loop, etc.)
  • Body is Teflon® Coated, for Maximum Cleanliness
  • Self-Draining Flow-Tubes, and Long-Life Heating Elements

Specifications:


Power:

  • 1.5 kW Total to 4.5 kW Total
  • Voltage Range: 120 - 415 V
  • Max Line Current: 30 A per circuit


Tubing:

  • .375” OD (3/8”) (9.52 mm)
  • .031” Wall (.80 mm)
  • Overall Process Tube Length: 190" (4826 mm)
  • PFA (PerFluoroAlkoxy) / Teflon® (standard)
  • High Purity PFA (optional upgrade)
  • Max Pressure: 70 psi (4.82 bar)


Body:

  • Aluminum with Black Teflon® Protective Coating


Enclosures:

  • NEMA 7 (explosion-proof)


Max Working Temperatures:

  • 392°F (200°C)


Sensors:

  • K or J Type Thermocouples Standard (Qty. 3)
  • 1 for Process Control
  • 1 for High-Limit Protection
  • 1 for Tube Temperature Protection


Available Accessories:

  • Insulating Jackets
  • Straight Union Fittings